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Proceedings Paper

Development of a novel EUV mask protection engineering tool and mask handling techniques
Author(s): Mitsuaki Amemiya; Kazuya Ota; Takashi Kamono; Hiroyoshi Kubo; Youichi Usui; Tadahiko Takikawa; Takao Taguchi; Osamu Suga
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Paper Abstract

We have developed a mask protection engineering tool (MPE Tool) that simulates various types of tests during the transfer of a mask or blank in air and in vacuum. We performed mask transfer experiments to investigate particle-free mask handling techniques using the MPE and mask inspection tools. We measured the number of particles accumulated during the transfer of the mask blanks. Less than 0.3 particles were added over a path from a load port (in air) to an ESC chamber (in vacuum) and more than half the particles accumulated appeared during the pumping down and purging steps in the load-lock chamber. Consequently, we consider that pumping down and purging are the most important steps for particle-free mask handling.

Paper Details

Date Published: 15 May 2007
PDF: 8 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66073G (15 May 2007); doi: 10.1117/12.729035
Show Author Affiliations
Mitsuaki Amemiya, Semiconductor Leading Edge Technologies, Inc. (Japan)
Kazuya Ota, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takashi Kamono, Semiconductor Leading Edge Technologies, Inc. (Japan)
Hiroyoshi Kubo, Semiconductor Leading Edge Technologies, Inc. (Japan)
Youichi Usui, Semiconductor Leading Edge Technologies, Inc. (Japan)
Tadahiko Takikawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takao Taguchi, Semiconductor Leading Edge Technologies, Inc. (Japan)
Osamu Suga, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

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