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Proceedings Paper

Automated aerial image based CD metrology initiated by pattern marking with photomask layout data
Author(s): Grant Davis; Sun Young Choi; Eui Hee Jung; Arne Seyfarth; Hans van Doornmalen; Eric Poortinga
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Paper Abstract

The photomask is a critical element in the lithographic image transfer process from the drawn layout to the final structures on the wafer. The non-linearity of the imaging process and the related MEEF impose a tight control requirement on the photomask critical dimensions. Critical dimensions can be measured in aerial images with hardware emulation. This is a more recent complement to the standard scanning electron microscope measurement of wafers and photomasks. Aerial image measurement includes non-linear, 3-dimensional, and materials effects on imaging that cannot be observed directly by SEM measurement of the mask. Aerial image measurement excludes the processing effects of printing and etching on the wafer. This presents a unique contribution to the difficult process control and modeling tasks in mask making. In the past, aerial image measurements have been used mainly to characterize the printability of mask repair sites. Development of photomask CD characterization with the AIMSTM tool was motivated by the benefit of MEEF sensitivity and the shorter feedback loop compared to wafer exposures. This paper describes a new application that includes: an improved interface for the selection of meaningful locations using the photomask and design layout data with the CalibreTM Metrology Interface, an automated recipe generation process, an automated measurement process, and automated analysis and result reporting on a Carl Zeiss AIMSTM system.

Paper Details

Date Published: 25 May 2007
PDF: 10 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66072A (25 May 2007); doi: 10.1117/12.728993
Show Author Affiliations
Grant Davis, Mentor Graphics Corp. (United States)
Sun Young Choi, Samsung Electronics Co., Ltd. (South Korea)
Eui Hee Jung, Samsung Electronics Co., Ltd. (South Korea)
Arne Seyfarth, Carl Zeiss SMS GmbH (Germany)
Hans van Doornmalen, Carl Zeiss SMS GmbH (Germany)
Eric Poortinga, Carl Zeiss SMT Inc. (United States)


Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

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