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Proceedings Paper

Stray-light implementation in optical proximity correction (OPC)
Author(s): Young-Chang Kim; Donghyun Kim; Insung Kim; Sangwook Kim; Sungsoo Suh; Yong-Jin Chun; Sukjoo Lee; Junghyeon Lee; Chang-Jin Kang; Jootae Moon; Kunal Taravade; Sooryong Lee
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Paper Abstract

It is suggested that stray-light (SL, also called flare, scattered light) impact can be compensated by modifying standard OPC method. Compared to traditional optical proximity effect caused by diffraction limit, stray light leads to extremely long range (~ 100 micrometer ~ 10 millimeter) proximity effect. Appropriate approximation is introduced for stray-light implemented OPC in such a large scale. This paper also addresses other practical problems in the stray-light OPC and presents how to solve the problems.

Paper Details

Date Published: 29 May 2007
PDF: 10 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66071M (29 May 2007); doi: 10.1117/12.728969
Show Author Affiliations
Young-Chang Kim, Samsung Electronics Co., Ltd. (South Korea)
Donghyun Kim, Samsung Electronics Co., Ltd. (South Korea)
Insung Kim, Samsung Electronics Co., Ltd. (South Korea)
Sangwook Kim, Samsung Electronics Co., Ltd. (South Korea)
Sungsoo Suh, Samsung Electronics Co., Ltd. (South Korea)
Yong-Jin Chun, Samsung Electronics Co., Ltd. (South Korea)
Sukjoo Lee, Samsung Electronics Co., Ltd. (South Korea)
Junghyeon Lee, Samsung Electronics Co., Ltd. (South Korea)
Chang-Jin Kang, Samsung Electronics Co., Ltd. (South Korea)
Jootae Moon, Samsung Electronics Co., Ltd. (South Korea)
Kunal Taravade, Synopsys, Inc. (United States)
Sooryong Lee, Synopsys, Inc. (United States)


Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

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