Share Email Print

Proceedings Paper

Study of hot spot detection using neural networks judgment
Author(s): Norimasa Nagase; Kouichi Suzuki; Kazuhiko Takahashi; Masahiko Minemura; Satoshi Yamauchi; Tomoyuki Okada
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We investigated the possibility of hotspot detection after lithography simulation by using Neural Networks (NN). We applied the image recognition technique by the NN for hotspot detection and confirmed the possibility by its recognition rate of the device pattern defects after NN learning. Various test patterns were prepared for NN learning and we investigated the convergence and the learning time of the NN. The compositions of the input and the hidden-layers of the NN do not have so much influence on the convergence of NN, but the initial parameter values of weight setting have predominant effect on the convergence of the NN. There are correlations among the learning time of the NN, the number of input samples and the number of hidden-layers, so a certain consideration is required for NN design. The hotspot recognition rate ranged from 90% to 42%, depending pattern type and learning sample number. Increasing learning sample number improves the recognition rate. But learning all type patterns leads to 55% recognition, so learning single type pattern leads to better recognition rate.

Paper Details

Date Published: 14 May 2007
PDF: 6 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66071B (14 May 2007); doi: 10.1117/12.728959
Show Author Affiliations
Norimasa Nagase, Fujitsu Ltd. (Japan)
Kouichi Suzuki, Fujitsu Ltd. (Japan)
Kazuhiko Takahashi, Fujitsu Ltd. (Japan)
Masahiko Minemura, Fujitsu Ltd. (Japan)
Satoshi Yamauchi, Fujitsu Ltd. (Japan)
Tomoyuki Okada, Fujitsu Ltd. (Japan)

Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

© SPIE. Terms of Use
Back to Top