
Proceedings Paper
Study of hot spot detection using neural networks judgmentFormat | Member Price | Non-Member Price |
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Paper Abstract
We investigated the possibility of hotspot detection after lithography simulation by using Neural Networks (NN). We
applied the image recognition technique by the NN for hotspot detection and confirmed the possibility by its recognition
rate of the device pattern defects after NN learning.
Various test patterns were prepared for NN learning and we investigated the convergence and the learning time of the
NN. The compositions of the input and the hidden-layers of the NN do not have so much influence on the convergence
of NN, but the initial parameter values of weight setting have predominant effect on the convergence of the NN. There
are correlations among the learning time of the NN, the number of input samples and the number of hidden-layers, so a
certain consideration is required for NN design.
The hotspot recognition rate ranged from 90% to 42%, depending pattern type and learning sample number. Increasing
learning sample number improves the recognition rate. But learning all type patterns leads to 55% recognition, so
learning single type pattern leads to better recognition rate.
Paper Details
Date Published: 14 May 2007
PDF: 6 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66071B (14 May 2007); doi: 10.1117/12.728959
Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)
PDF: 6 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66071B (14 May 2007); doi: 10.1117/12.728959
Show Author Affiliations
Norimasa Nagase, Fujitsu Ltd. (Japan)
Kouichi Suzuki, Fujitsu Ltd. (Japan)
Kazuhiko Takahashi, Fujitsu Ltd. (Japan)
Kouichi Suzuki, Fujitsu Ltd. (Japan)
Kazuhiko Takahashi, Fujitsu Ltd. (Japan)
Masahiko Minemura, Fujitsu Ltd. (Japan)
Satoshi Yamauchi, Fujitsu Ltd. (Japan)
Tomoyuki Okada, Fujitsu Ltd. (Japan)
Satoshi Yamauchi, Fujitsu Ltd. (Japan)
Tomoyuki Okada, Fujitsu Ltd. (Japan)
Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)
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