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Proceedings Paper

Cost-effective pattern inspection system using Xe-Hg lamp in challenge of sub-65-nm node
Author(s): Won Sun Kim; Jin Hyung Park; Dong-Hoon Chung; Sang-Gyun Woo
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Paper Abstract

The importance of mask pattern inspection is increased as design node shrinks below. The major reason is as follows. Firstly, inspection systems have to enhance sensitivity because the high grade devices are seriously affected from small defects compared with low grades. The other is SRAFs RET masks. In order to inspect SRAF properly, inspection systems need severer conditions such as small pixel size, short wavelength and special algorithms. Therefore, it takes more than 3 hours to inspect a mask and this increasing inspection time is a serious burden in mask making process. Moreover in spite of mask market and its infrastructure, cost of inspection system is too high. In this paper, the advantages of using Xe-Hg lamp instead of a DUV laser are presented. Special defect algorithms get over low sensitivity of lamp optics. We have evaluated performances of the defect inspection system with programmed defect mask and production mask. The inspection system is cost-effective because the optic part is configured by DUV lamp and fiber optic delivery system. The fast scanning speed is enough to charge the inspection capacity in the fabrication line. These features of the system well match with the flexibility of the facility layout in the mask production.

Paper Details

Date Published: 14 May 2007
PDF: 9 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660717 (14 May 2007); doi: 10.1117/12.728956
Show Author Affiliations
Won Sun Kim, Samsung Electronics Co., Ltd. (South Korea)
Jin Hyung Park, Samsung Electronics Co., Ltd. (South Korea)
Dong-Hoon Chung, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)

Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

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