Share Email Print
cover

Proceedings Paper

High-performance reticle inspection tool for the 65-nm node and beyond
Author(s): Tung-Yaw Kang; Chia-Hsien Chen; Chia Hui Ho; Luke Hsu; Yao-Ching Ku; Kazuyoshi Nakamura; Hideyuki Moribe; Takeshi Bashomatsu; Kenichi Matsumura; Keiichi Hatta; Hiroyuki Takahashi; Akira Uehara; Takahiro Igeta; Hiroshi Uno; Ryou Igarashi; Hiroaki Matsuda
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A new DUV high-resolution reticle defect inspection platform has been developed. This platform is designed to meet the reticle qualification requirements of the 65-nm node and beyond. In this system, the transmitted and reflected inspection lights are collected simultaneously to produce reticle images at high speed. Transmitted and reflected inspections in the die-to-die (DD) and the die-to-database (DB) modes can be executed concurrently. Both images can be gathered at full synchronization with low noise. Basically, both inspection modes are needed to detect as many types of hard and soft defects as possible. Concurrent inspection saves time from using transmitted and reflected lights sequentially. In this presentation, results of DD and DB inspection using standard programmed defect test reticles as well as advanced 65-nm production reticles, are given, showing high-sensitivity and low-false-count detections being achieved with low operating cost.

Paper Details

Date Published: 29 May 2007
PDF: 10 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660716 (29 May 2007); doi: 10.1117/12.728955
Show Author Affiliations
Tung-Yaw Kang, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chia-Hsien Chen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chia Hui Ho, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Luke Hsu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Yao-Ching Ku, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Kazuyoshi Nakamura, NEC Corp. (Japan)
Hideyuki Moribe, NEC Corp. (Japan)
Takeshi Bashomatsu, NEC Corp. (Japan)
Kenichi Matsumura, NEC Corp. (Japan)
Keiichi Hatta, NEC Control Systems, Ltd. (Japan)
Hiroyuki Takahashi, NEC Control Systems, Ltd. (Japan)
Akira Uehara, NEC Control Systems, Ltd. (Japan)
Takahiro Igeta, NEC Control Systems, Ltd. (Japan)
Hiroshi Uno, NEC Control Systems, Ltd. (Japan)
Ryou Igarashi, NEC Control Systems, Ltd. (Japan)
Hiroaki Matsuda, NEC Control Systems, Ltd (Japan)


Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

© SPIE. Terms of Use
Back to Top