Share Email Print
cover

Proceedings Paper

Requirements of nano-machining repair system for 45-nm node
Author(s): Sang-Hyeon Lee; Hwa-Sung Kim; Hong-Seok Shim; Su-Young Lee; Geun-Bae Kim; Hyuk-Joo Kwon; Sang-Gyun Woo; Han-Ku Cho
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Nano-machining repair tool plays an important role in the current 65 nm node photomask repair. It removes defects mechanically with nanometer sized diamond tip with high accuracy and low damage using high accuracy AFM data. The repair performance of nano-machining repair system largely depends on the diamond tip whose aspect ratio decides the minimum reparable feature size. As the device shrinks to 45 nm or 32 nm node, higher aspect ratio tip with weak structure is required. It is contradiction to the fact that more accurate edge placement and better repair slope is required in smaller node repair, because deflection or tip wear effect could happen in high aspect ratio tip. In this article, deflection and wear effect were investigated in single layer repair recipe using SEM and AIMSTM. Multilayer recipe which complements weak structure was estimated carefully, and some limits were discussed. Finally some requirements of nano-machining repair system for 45 nm node were presented.

Paper Details

Date Published: 14 May 2007
PDF: 10 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660712 (14 May 2007); doi: 10.1117/12.728951
Show Author Affiliations
Sang-Hyeon Lee, Samsung Electronics Co., Ltd. (South Korea)
Hwa-Sung Kim, Samsung Electronics Co., Ltd. (South Korea)
Hong-Seok Shim, Samsung Electronics Co., Ltd. (South Korea)
Su-Young Lee, Samsung Electronics Co., Ltd. (South Korea)
Geun-Bae Kim, Samsung Electronics Co., Ltd. (South Korea)
Hyuk-Joo Kwon, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)
Han-Ku Cho, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

© SPIE. Terms of Use
Back to Top