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Proceedings Paper

CD metrology by an immersion microscope with high NA condenser lens for 45-nm generation masks
Author(s): Takeshi Yamane; Rikiya Taniguchi; Takashi Hirano
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Paper Abstract

An immersion microscope with high NA condenser lens is evaluated. The effects of high NA condenser lens are studied with simulation and experiment. The one effect is CD linearity improvement. We have already reported that our calibration method improves CD linearity of an immersion microscope. The simulation result indicates the high NA condenser lens improves the accuracy of the calibration method. The other effect is CD repeatability. The experimental result demonstrates the high NA condenser lens reduces the peak of intensity profile and improves CD repeatability. As the result, an immersion microscope with high NA condenser lens is available for CD measurement of 45 nm generation masks.

Paper Details

Date Published: 14 May 2007
PDF: 6 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660711 (14 May 2007); doi: 10.1117/12.728950
Show Author Affiliations
Takeshi Yamane, Toshiba Corp. Semiconductor Co. (Japan)
Rikiya Taniguchi, Toshiba Corp. Semiconductor Co. (Japan)
Takashi Hirano, Toshiba Corp. Semiconductor Co. (Japan)


Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

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