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Proceedings Paper

Data exploder for variable shaped beam exposure
Author(s): John Nogatch; Hartmut Kirsch; Jun Shi
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Paper Abstract

As the industry moves to 45nm and beyond, rapidly increasing file sizes are an obstacle to achieving fast turnaround time for mask manufacturing. Conventional Mask Data Preparation (MDP) requires the production of large files, in a format specific to each make and model of E-beam tool. An alternative approach extracts the data from a data file already present in the MDP flow, and provides it directly to the E-beam tool. This extraction is called a "Data Exploder", because the output data volume can be larger than the input data. Exploding the data in real-time saves the time required to write and then read large disk files. The Data Exploder is compatible with multithread and multiprocess parallel reading. The practical application and limitations of the Data Exploder are described, including throughput performance, requirements for disk storage, network interconnect, and CPU configurations.

Paper Details

Date Published: 11 May 2007
PDF: 8 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66070W (11 May 2007); doi: 10.1117/12.728946
Show Author Affiliations
John Nogatch, Synopsys, Inc. (United States)
Hartmut Kirsch, Synopsys, Inc. (United States)
Jun Shi, Synopsys, Inc. (United States)


Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

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