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Proceedings Paper

A specialized cell-wise OPC method for OPC-unfriendly spot detection
Author(s): Ye Chen; Zheng Shi
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Paper Abstract

To reduce design spin time, OPC-unfriendly spots in IC layout should be found out by designer before tapeout. This can be done by firstly running a "trial OPC" step on the layout, followed by running an ORC step to verify the result. In this paper we introduce a specialized cell-wise OPC method using an edge bias modeling method to improve the accuracy while keeping the advantage on correction speed, which is dozens of times faster than traditional model-based OPC method. This makes the algorithm a good choice for "trial OPC".

Paper Details

Date Published: 12 May 2007
PDF: 9 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66070O (12 May 2007); doi: 10.1117/12.728938
Show Author Affiliations
Ye Chen, Zhejiang Univ. (China)
Zheng Shi, Zhejiang Univ. (China)


Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

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