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Proceedings Paper

Multilayer bottom topography effect on actinic mask-blank inspection signal
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Paper Abstract

The detectability of a small phase defect on a multilayer-coated mask blank was investigated by using electromagnetic simulation. When a smoothing deposition of multilayer coating is used the inspection signal from the phase defects is characterized not only by a top surface topography of the multilayer but also by bottom topography. To understand the impact of the bottom topography we first calculated the phase shift of reflected EUV light from multilayers with various bi-layer thicknesses since the smoothing effect may be equivalent to the local multilayer thickness variation. Then, we estimated the actinic inspection signal intensity from bump, pit, line, and groove defects taking into account the phase shift due to bi-layer thickness change and the phase change due to the top surface topography. Simulation results revealed that the phase shift due to the top surface topography was enhanced by smoothing deposition for both convex and concave shaped phase defects. Thus the bump defect is detected as higher bump than the actual height of top surface and the pit defect is detected as a deeper pit than the surface depth.

Paper Details

Date Published: 14 May 2007
PDF: 9 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66070K (14 May 2007); doi: 10.1117/12.728934
Show Author Affiliations
Tsuneo Terasawa, MIRAI-Semiconductor Leading Edge Technologies Inc. (Japan)
Toshihiko Tanaka, MIRAI-Semiconductor Leading Edge Technologies Inc. (Japan)
Osamu Suga, MIRAI-Semiconductor Leading Edge Technologies Inc. (Japan)
Toshihisa Tomie, National Institute of Advanced Industrial Science and Technology (Japan)


Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

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