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Proceedings Paper

Development of Sn-fueled high-power DPP EUV source for enabling HVM
Author(s): Yusuke Teramoto; Zenzo Narihiro; Daiki Yamatani; Takuma Yokoyama; Kazunori Bessho; Yuki Joshima; Takahiro Shirai; Shinsuke Mouri; Takahiro Inoue; Hiroshi Mizokoshi; Gohta Niimi; Tomonao Hosokai; Hironobu Yabuta; Kohkan C. Paul; Tetsu Takemura; Toshio Yokota; Kiyoyuki Kabuki; Koji Miyauchi; Kazuaki Hotta; Hiroto Sato
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Paper Abstract

Discharge-produced plasma (DPP)-based EUV source is being developed at Gotenba Branch of EUVA Hiratsuka R&D Center. A high-repetition-rate high voltage power supply (HVPS) was developed and put into operation on the magnetic pulse compression (MPC)-driven DPP source, enabling 8-kHz operation with 15 J/pulse of maximum charging energy and 0.11 % of stability. SnH4 gas was used as a fuel gas in order to obtain high conversion efficiency. SnH4-fueled Z-pinch source demonstrated EUV power of 700 W/2&pgr;sr within 2 % bandwidth around 13.5 nm. Using a nested grazing-incidence collector, EUV power at the intermediate focus which is defined as an interface to the exposure tool reached 62 W with 3.3 mm2sr of etendue. Tin deposition rate on the collector surface, which is the concern in any tin-fueled EUV sources, was decreased by four orders of magnitude as a result of debris-shield development. Cleaning processes were also developed to enhance total lifetime of the collector. A sequence of intentional deposition and cleaning process for the ruthenium grazing-incidence mirror sample was repeated 13 times. By measuring reflectivity of the mirror, it was confirmed that halogen cleaning process worked very effectively and did not get the mirror damaged after such a long-term cleaning experiment.

Paper Details

Date Published: 21 March 2007
PDF: 9 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65173R (21 March 2007); doi: 10.1117/12.728711
Show Author Affiliations
Yusuke Teramoto, Extreme Ultraviolet Lithography System Development Association (Japan)
Zenzo Narihiro, Extreme Ultraviolet Lithography System Development Association (Japan)
Daiki Yamatani, Extreme Ultraviolet Lithography System Development Association (Japan)
Takuma Yokoyama, Extreme Ultraviolet Lithography System Development Association (Japan)
Kazunori Bessho, Extreme Ultraviolet Lithography System Development Association (Japan)
Yuki Joshima, Extreme Ultraviolet Lithography System Development Association (Japan)
Takahiro Shirai, Extreme Ultraviolet Lithography System Development Association (Japan)
Shinsuke Mouri, Extreme Ultraviolet Lithography System Development Association (Japan)
Takahiro Inoue, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Mizokoshi, Extreme Ultraviolet Lithography System Development Association (Japan)
Gohta Niimi, Ushio Inc. (Japan)
Tomonao Hosokai, Ushio Inc. (Japan)
Hironobu Yabuta, Extreme Ultraviolet Lithography System Development Association (Japan)
Kohkan C. Paul, Extreme Ultraviolet Lithography System Development Association (Japan)
Tetsu Takemura, Extreme Ultraviolet Lithography System Development Association (Japan)
Toshio Yokota, Extreme Ultraviolet Lithography System Development Association (Japan)
Kiyoyuki Kabuki, Extreme Ultraviolet Lithography System Development Association (Japan)
Koji Miyauchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Kazuaki Hotta, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroto Sato, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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