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Proceedings Paper

Experimental validation of 20nm sensitivity of singular beam microscopy
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Paper Abstract

Quickly developing nanotechnology drives the industrial need for fast but sensitive nano-scale feature detection and evaluation. In this work we bypass the diffraction limit for achieving nanoscale sensitivity by introducing optical singularities into the illuminating beam for a modified laser scanning microscopic architecture. A good correspondence was obtained between laboratory experiments and corresponding simulations that indicated a theoretical potential of 1nm sensitivity under a practical signal to noise ratio of 30dB. For analysis of the experimental and simulation results, two simple but effective algorithms were developed. A significant improvement of signal to noise ratio in the optical system with coherent light illumination can be achieved by utilization a highly redundant data collected during experiments. Our experimental results validate achievable sensitivity down to 20nm. The unique combination of nano-scale sensitivity together with implementation simplicity and on-line, real-time analysis capability make Singular Beam Microscopy a valuable industrial analytic method.

Paper Details

Date Published: 18 June 2007
PDF: 9 pages
Proc. SPIE 6616, Optical Measurement Systems for Industrial Inspection V, 661622 (18 June 2007); doi: 10.1117/12.728539
Show Author Affiliations
Boris Spektor, Technion - Israel Institute of Technology (Israel)
Alexander Normatov, Technion - Israel Institute of Technology (Israel)
Joseph Shamir, Technion - Israel Institute of Technology (Israel)


Published in SPIE Proceedings Vol. 6616:
Optical Measurement Systems for Industrial Inspection V
Wolfgang Osten; Christophe Gorecki; Erik L. Novak, Editor(s)

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