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Proceedings Paper

Optical scatterometry with analytic approaches applied to periodic nano-arrays including anisotropic layers
Author(s): I. Abdulhalim
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Paper Abstract

Optical scatterometry is being used as a powerful technique for measurement of sub-wavelength periodic structures. It is based on measuring the scattered signal and solving the inverse scattering problem. For periodic nano-arrays with feature size less than 100nm, it is possible to simplify the electromagnetic simulations using the Rytov near quasi-static approximation valid for feature periods only few times less than the wavelength. This is shown to be adequate for the determination of the structure parameters from the zero order reflected or transmitted waves and their polarization or ellipsometric properties. The validity of this approach is applied to lamellar nano-scale grating photo-resist lines on Si substrate. Formulation for structures containing anisotropic multilayers is presented using the 4x4 matrix approach.

Paper Details

Date Published: 18 June 2007
PDF: 8 pages
Proc. SPIE 6617, Modeling Aspects in Optical Metrology, 661714 (18 June 2007); doi: 10.1117/12.726678
Show Author Affiliations
I. Abdulhalim, Ben Gurion Univ. of the Negev (Israel)

Published in SPIE Proceedings Vol. 6617:
Modeling Aspects in Optical Metrology
Harald Bosse; Bernd Bodermann; Richard M. Silver, Editor(s)

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