Share Email Print

Proceedings Paper

Optimization of HfO2,Al2O3 and SiO2 deposition leading to advanced UV optical coatings with low extinction
Author(s): Giedrius Abromavičius; Rytis Buzelis; Ramutis Drazdys; Dainius Perednis; Alfridas Skrebutėnas
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The performance of optical coatings for UV region (200-300 nm) is closely related to their optical losses. There are a few factors which significantly influence the extinction of deposited coating - deposition vacuum, contamination from filaments of e-beam guns, ion source and finally, the optical properties of selected deposition materials. In this work the contribution of these different factors was investigated and evaluated. HfO2, Al2O3 and SiO2 are the most widely used materials for producing UV optical coatings down to 200 nm. Influence of background oxygen pressure during HfO2 and Al2O3 deposition was evaluated which enabled to reduce extinction of the deposited UV optical coatings.

Paper Details

Date Published: 25 January 2007
PDF: 5 pages
Proc. SPIE 6596, Advanced Optical Materials, Technologies, and Devices, 65961N (25 January 2007); doi: 10.1117/12.726563
Show Author Affiliations
Giedrius Abromavičius, Institute of Physics (Lithuania)
Rytis Buzelis, Institute of Physics (Lithuania)
Ramutis Drazdys, Institute of Physics (Lithuania)
Dainius Perednis, Institute of Physics (Lithuania)
Alfridas Skrebutėnas, Optida (Lithuania)

Published in SPIE Proceedings Vol. 6596:
Advanced Optical Materials, Technologies, and Devices

© SPIE. Terms of Use
Back to Top