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Proceedings Paper

Application of laser plasma soft x-ray and EUV sources in micro- and nanotechnology
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Paper Abstract

Results on micro- and nanoprocessing of organic polymers using X-rays and extreme ultraviolet (EUV) generated from laser-plasma radiation sources are presented in the paper. The sources used in the studies are based on the gas puff target approach developed at the Institute of Optoelectronics, Warsaw. Processing of polymers is connected with non-thermal ablation under the influence of energetic photons of X-ray and EUV radiation. The process can be useful for practical applications as it makes possible to produce structures with sub-micron spatial resolution that is not possible using the thermal ablation. The new technology will be used for production of photonic microstructures and for modification of polymer surfaces for biomedical applications.

Paper Details

Date Published: 23 January 2007
PDF: 8 pages
Proc. SPIE 6598, Laser Technology VIII: Applications of Lasers, 65980G (23 January 2007); doi: 10.1117/12.726547
Show Author Affiliations
Henryk Fiedorowicz, Military Univ. of Technology (Poland)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Krzysztof Jakubczak, Military Univ. of Technology (Poland)
Roman Jarocki, Military Univ. of Technology (Poland)
Libor Juha, Joint Research Lab. PALS (Czech Republic)
Jerzy Kostecki, Military Univ. of Technology (Poland)
Ladislav Pina, Czech Technical Univ. (Czech Republic)
Rafał Rakowski, Military Univ. of Technology (Poland)
Mirosław Szczurek, Military Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 6598:
Laser Technology VIII: Applications of Lasers
Wieslaw Wolinski; Zdzislaw Jankiewicz; Ryszard S. Romaniuk, Editor(s)

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