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Proceedings Paper

Studies of composite system of iron porphyrin immobilized on aminosilanized Si
Author(s): Irena Šimkienė; Julija Sabataitytė; Alfonsas Rėza; Artūras Suchodolskis; G. Jurgis Babonas
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Paper Abstract

Composite system of iron porphyrin (FeTPPS) on aminosilanized Si substrates was investigated by studies of surface morphology and optical response. Aminofunctionalized siloxane films on silicon substrates were produced from different sol-gel precursors prepared from 3-aminopropyltriethoxysilane (APTES) dissolved in water, ethanol and acetone. Immersion technique was used for the formation of APTES films. Aqueous solutions of FeTPPS were deposited on aminosilanized Si substrates. Topographic features of nanostructures in composite FeTPPS/APTES/Si system were investigated by atomic force microscopy (AFM) technique. High-resolution phase contrast imaging revealed the substructure of siloxane films on silicon substrates and nanoaggregates of FeTPPS immobilized on aminosilanized Si surface. Spectroscopic ellipsometry measurements were carried out in the region 1-5 eV in order to characterize the siloxane films and composite structures. The analysis of obtained results allowed one to conclude that FeTPPS molecules were attached to the surface by covalent bonds between the functional group of sulfonic acid SO3- of iron porphyrin and (-NH2H+)-group of APTES.

Paper Details

Date Published: 25 January 2007
PDF: 6 pages
Proc. SPIE 6596, Advanced Optical Materials, Technologies, and Devices, 659611 (25 January 2007); doi: 10.1117/12.726485
Show Author Affiliations
Irena Šimkienė, Semiconductor Physics Institute (Lithuania)
Vilnius Univ. (Lithuania)
Julija Sabataitytė, Semiconductor Physics Institute (Lithuania)
Alfonsas Rėza, Semiconductor Physics Institute (Lithuania)
Artūras Suchodolskis, Semiconductor Physics Institute (Lithuania)
G. Jurgis Babonas, Semiconductor Physics Institute (Lithuania)
Vilnius Gediminas Technical Univ. (Lithuania)

Published in SPIE Proceedings Vol. 6596:
Advanced Optical Materials, Technologies, and Devices
Steponas Ašmontas; Jonas Gradauskas, Editor(s)

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