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Proceedings Paper

3D simulations of electromagnetic fields in nanostructures using the time-harmonic finite-element method
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Paper Abstract

Rigorous computer simulations of propagating electromagnetic fields have become an important tool for optical metrology and optics design of nanostructured components. As has been shown in previous benchmarks some of the presently used methods suffer from low convergence rates and/or low accuracy of the results and exhibit very long computation times1, 2 which makes application to extended 2D layout patterns impractical. We address 3D simulation tasks by using a finite-element solver which has been shown to be superior to competing methods by several orders of magnitude in accuracy and computational time for typical microlithography simulations.2 We report on the current status of the solver, incorporating higher order edge elements, adaptive refinement methods, and fast solution algorithms. Further, we investigate the performance of the solver in the 3D simulation project of light diffraction off an alternating phase-shift contact-hole mask.

Paper Details

Date Published: 18 June 2007
PDF: 11 pages
Proc. SPIE 6617, Modeling Aspects in Optical Metrology, 66170V (18 June 2007); doi: 10.1117/12.726236
Show Author Affiliations
Sven Burger, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Lin Zschiedrich, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Frank Schmidt, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Roderick Köhle, Qimonda AG (Germany)
Thomas Henkel, Qimonda Dresden GmbH & Co (Germany)
Bernd Küchler, Qimonda Dresden GmbH & Co (Germany)
Christoph Nölscher, Qimonda Dresden GmbH & Co (Germany)


Published in SPIE Proceedings Vol. 6617:
Modeling Aspects in Optical Metrology
Harald Bosse; Bernd Bodermann; Richard M. Silver, Editor(s)

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