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Proceedings Paper

Scatterometry from crossed grating structures in different configurations
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Paper Abstract

Scatterometry proved to be a powerful technique for CD and profile metrology. In contrast to alternative methods like scanning electron microscopy (SEM) it is an integral method that reconstructs structure parameters from a comparison between measured and simulated spectra. It is well established in the field of line / space gratings and gaining importance for crossed grating structures. The simulation tool MicroSim, which was developed at the Institute for Technical Optics (ITO) in Stuttgart, has recently been extended to arbitrarily shaped crossed grating structures. Besides the shape also the pitches and mode numbers in the two directions of periodic continuation can be selected freely. In this article, different measurement configurations are discussed regarding as an example an asymmetric crossed grating structure. The depth of an asymmetric etch ought to be measured as well as its width. For the depth a conventional spectroscopic ellipsometric setup can be applied, whereas for the width an angle scan is proposed. In this configuration the wavelength remains constant while the sample is rotated around its normal.

Paper Details

Date Published: 18 June 2007
PDF: 9 pages
Proc. SPIE 6617, Modeling Aspects in Optical Metrology, 661715 (18 June 2007); doi: 10.1117/12.726229
Show Author Affiliations
Thomas Schuster, Institut fuer Technische Optik (Germany)
Stephan Rafler, Institut fuer Technische Optik (Germany)
Wolfgang Osten, Institut fuer Technische Optik (Germany)
Peter Reinig, Qimonda Dresden (Germany)
Thomas Hingst, Qimonda Dresden (Germany)

Published in SPIE Proceedings Vol. 6617:
Modeling Aspects in Optical Metrology
Harald Bosse; Bernd Bodermann; Richard M. Silver, Editor(s)

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