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Proceedings Paper

Model-based analysis of the limits of optical metrology with experimental comparisons
Author(s): R. M. Silver; R. Attota; E. Marx
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Paper Abstract

This paper presents a summary and analysis of a study on optical modeling for critical dimension metrology. The paper is focused on two primary elements: 1) the comparison, stability, and validity of multiple electromagnetic scattering models and 2) a series of model-to-experiment comparisons. A part of the study will cover improved model-to-theory agreement obtained using our new Scatterfield microscopy technique, which has enabled evaluation of previous unquantified errors. The Scatterfield microscopy technique allows us to step or scan an aperture in a conjugate back focal plane of the objective lens enabling illumination of a narrow cone of incident plane waves at a given primary angle of incidence. A series of angle resolved images or intensity data can be obtained for each angle of illumination.

Paper Details

Date Published: 18 June 2007
PDF: 13 pages
Proc. SPIE 6617, Modeling Aspects in Optical Metrology, 66170W (18 June 2007); doi: 10.1117/12.726201
Show Author Affiliations
R. M. Silver, National Institute of Standards and Technology (United States)
R. Attota, National Institute of Standards and Technology (United States)
E. Marx, National Institute of Standards and Technology (United States)

Published in SPIE Proceedings Vol. 6617:
Modeling Aspects in Optical Metrology
Harald Bosse; Bernd Bodermann; Richard M. Silver, Editor(s)

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