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Proceedings Paper

Optical characterization procedure for large thin films
Author(s): Juan F. Trigo; José Herrero; Leonardo Soriano; María Teresa Gutiérrez
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Paper Abstract

Our goal was to characterize large thin films from reflectance and transmittance (R-T) measurements. We focus on the homogeneity of the films related to the geometrical information of their deposition system. This is not an easy task in multisource deposition systems where film thickness mapping and chemical lateral distribution should be checked. In fact, the optical constants lateral variation influences the determination of the size parameters (thickness, roughness). A precise analysis requires determination of every optical parameter on every sample point. This independent point analysis is highly time consuming and results in noisy maps when the represented parameters are strongly correlated. We present a new approach to a global fitting strategy. We have modified our general-purpose software for R-T thin film characterization, adding this global mapping capability. The advantages of our procedure match the challenge of the in situ monitoring in the industrial film processing. As in other mapping procedures, a previous knowledge of our measured system is needed. A detailed optical determination of an In2S3 10x10cm film is presented as an example. Principal Component Analysis has been done with the extracted optical constants in order to reduce the data. This information has been introduced in our automatic global analysis software. The fitting of the same data set resulted on similar but consistent and smoother maps and in around 1/5 of the computing time.

Paper Details

Date Published: 18 June 2007
PDF: 11 pages
Proc. SPIE 6617, Modeling Aspects in Optical Metrology, 661712 (18 June 2007); doi: 10.1117/12.726086
Show Author Affiliations
Juan F. Trigo, CIEMAT (Spain)
José Herrero, CIEMAT (Spain)
Leonardo Soriano, Univ. Autónoma de Madrid (Spain)
María Teresa Gutiérrez, CIEMAT (Spain)

Published in SPIE Proceedings Vol. 6617:
Modeling Aspects in Optical Metrology
Harald Bosse; Bernd Bodermann; Richard M. Silver, Editor(s)

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