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Proceedings Paper

Structure modeling for scatterometric characterization of photoinduced surface relief gratings
Author(s): Petre C. Logofatu; Ileana Apostol; Marie-Claude Castex; Victor Damian; Iuliana Iordache; Mihaela Bojan; Dan Apostol
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Paper Abstract

Surface-relief photo-polymer gratings obtained through the novel technique of photoinduced single step inscription in photopolymers are characterized through various investigations means, with an emphasis on scatterometry. The characterization of the gratings is necessary not only for insight in the creation process of gratings but also for checking the reproducibility and uniformity. The diffraction efficiencies of the various orders diffracted by the grating were measured and they were fitted to theoretical predictions corresponding to various structure models of the gratings. The fitting procedure is used to provide the parameters of the gratings, such as the width, the grating height, the pitch or shape factors, such as the wall angles for a trapezoidal structure. The shape of the gratings was quite complicated and the fitting, for this reason, a challenge. Numerous models were proposed, tried and their advantages and shortcomings discussed.

Paper Details

Date Published: 18 June 2007
PDF: 12 pages
Proc. SPIE 6617, Modeling Aspects in Optical Metrology, 661717 (18 June 2007); doi: 10.1117/12.726060
Show Author Affiliations
Petre C. Logofatu, National Institute for Laser, Plasma and Radiation Physics (Romania)
Ileana Apostol, National Institute for Laser, Plasma and Radiation Physics (Romania)
Marie-Claude Castex, Lab. de Physique des Lasers, Univ. Paris-Nord (France)
Victor Damian, National Institute for Laser, Plasma and Radiation Physics (Romania)
Iuliana Iordache, National Institute for Laser, Plasma and Radiation Physics (Romania)
Mihaela Bojan, National Institute for Laser, Plasma and Radiation Physics (Romania)
Dan Apostol, National Institute for Laser, Plasma and Radiation Physics (Romania)


Published in SPIE Proceedings Vol. 6617:
Modeling Aspects in Optical Metrology
Harald Bosse; Bernd Bodermann; Richard M. Silver, Editor(s)

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