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Proceedings Paper

Modeling image formation on pixelated devices for vision systems using wave-front coding
Author(s): Salvador Bosch; Francesc Gómez-Morales; Guillem Carles; Josep Ferré-Borrull
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Paper Abstract

Wave-front coding techniques are being used nowadays in vision systems to obtain invariance to aberrations and, especially, extended depth of focus capabilities. Besides using a phase mask for coding, one of the basic steps of the method is the digital processing of the images captured by means of a pixelated sensor (for example a CCD device). This capture process can become crucial for the overall performance of the procedures, since the effects due to the averaging within a pixel and to the related noise inherent to the detection can be indeed the most determinant ones. This work presents a simulation tool for fully assessing the role of a pixelated sensor in a vision system working by wave-front coding techniques, including diffractive effects, the averaging in detection, the modeling of the noise that might be added and the influence in the restoration algorithm. The numerical tool computes (in order): diffraction during image formation, averaging at the pixels and digital image processing. Similarly, noise could be added to the detection as well as other effects influencing the final image quality. The influence of these topics in the design of the phase masks is analyzed for several cases. Our results show that the pixelated character of the detector can not be considered a final refinement only and can not be obviated in the design stage of phase plates for wave-front coding.

Paper Details

Date Published: 18 June 2007
PDF: 9 pages
Proc. SPIE 6617, Modeling Aspects in Optical Metrology, 661705 (18 June 2007); doi: 10.1117/12.725884
Show Author Affiliations
Salvador Bosch, Univ. de Barcelona (Spain)
Francesc Gómez-Morales, Univ. de Barcelona (Spain)
Guillem Carles, Univ. de Barcelona (Spain)
Josep Ferré-Borrull, Univ. Rovira i Virgili (Spain)


Published in SPIE Proceedings Vol. 6617:
Modeling Aspects in Optical Metrology
Harald Bosse; Bernd Bodermann; Richard M. Silver, Editor(s)

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