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Proceedings Paper

Two-dimensional MEMS array for maskless lithography and wavefront modulation
Author(s): D. López; V. A. Aksyuk; G. P. Watson; W. M. Mansfield; R. Cirelli; F. Klemens; F. Pardo; E. Ferry; J. Miner; T. W. Sorsch; M. Peabody; J. Bower; C. S. Pai; J. Gates
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Paper Abstract

We review the fabrication process of a recently introduced phase only MEMS based spatial light modulators for maskless lithography. A brief description of this device is presented. The physical properties of its structural layers and the difficulties encountered during its fabrication process are described in detail.

Paper Details

Date Published: 15 May 2007
PDF: 8 pages
Proc. SPIE 6589, Smart Sensors, Actuators, and MEMS III, 65890S (15 May 2007); doi: 10.1117/12.724467
Show Author Affiliations
D. López, Alcatel Lucent, Bell Labs. (United States)
V. A. Aksyuk, Alcatel Lucent, Bell Labs. (United States)
G. P. Watson, Alcatel Lucent, Bell Labs. (United States)
W. M. Mansfield, Alcatel Lucent, Bell Labs. (United States)
R. Cirelli, Alcatel Lucent, Bell Labs. (United States)
F. Klemens, Alcatel Lucent, Bell Labs. (United States)
F. Pardo, Alcatel Lucent, Bell Labs. (United States)
E. Ferry, Alcatel Lucent, Bell Labs. (United States)
J. Miner, Alcatel Lucent, Bell Labs. (United States)
T. W. Sorsch, Alcatel Lucent, Bell Labs. (United States)
M. Peabody, Alcatel Lucent, Bell Labs. (United States)
J. Bower, Alcatel Lucent, Bell Labs. (United States)
C. S. Pai, Alcatel Lucent, Bell Labs. (United States)
J. Gates, Alcatel Lucent, Bell Labs. (United States)


Published in SPIE Proceedings Vol. 6589:
Smart Sensors, Actuators, and MEMS III
Thomas Becker; Carles Cané; N. Scott Barker, Editor(s)

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