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Proceedings Paper

Ablation of inorganic materials using laser plasma soft x-rays
Author(s): Tetsuya Makimura; Takashige Fujimori; Satoshi Uchida; Kouichi Murakami; Hiroyuki Niino
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Paper Abstract

We have investigated ablation of inorganic materials using pulsed and focused soft X-rays. Soft X-rays in a range of 1-500 eV were produced by irradiation of Ta targets with Q-switched Nd:YAG laser light (532 nm, 0.5-0.8 J/pulse) with a pulse duration of 10 ns in a vacuum chamber. The soft X-rays were focused on the surfaces of inorganic materials using an ellipsoidal mirror at approximately 0.1 J/cm2. The ellipsoidal mirror is designed so as to focus soft X-rays at about 100 eV efficiently, while it can not reflect soft X-rays above 200 eV. We found that synthetic quartz glass, Pyrex, LiF, CaF2, Al2O3 and LiNbO3, can be ablated by focused and pulsed soft X-rays. Typically, synthetic quartz glass is ablated at 50 nm/shot. We found that ablation occurs at X-ray fluences beyond the ablation threshold. Using a nano-scaled contact mask, trenches with a width of 50 nm and an aspect ratio of 1 are formed. The result indicates the diffusion length of absorbed energy during irradiation is less than 50 nm and that the accumulation results in ablation. The technique can also be applied to basic research of the interaction of intense soft X-rays with materials and resulting damage to the materials.

Paper Details

Date Published: 5 May 2007
PDF: 15 pages
Proc. SPIE 6586, Damage to VUV, EUV, and X-ray Optics, 658609 (5 May 2007); doi: 10.1117/12.723799
Show Author Affiliations
Tetsuya Makimura, Univ. of Tsukuba (Japan)
Takashige Fujimori, Univ. of Tsukuba (Japan)
Satoshi Uchida, Univ. of Tsukuba (Japan)
Kouichi Murakami, Univ. of Tsukuba (Japan)
Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (Japan)


Published in SPIE Proceedings Vol. 6586:
Damage to VUV, EUV, and X-ray Optics
Libor Juha; Ryszard H. Sobierajski; Hubertus Wabnitz, Editor(s)

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