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Proceedings Paper

Formation of 4-beam laser interference patterns for nanolithography
Author(s): Jin Zhang; Zuobin Wang; Yury K. Verevkin; Santiago M. Olaizola; Changsi Peng; Chunlei Tan; Ainara Rodriguez; Eric Y. Daume; Thierry Berthou; Stéphane Tisserand; Ze Ji
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Paper Abstract

This paper presents a theoretical analysis of formation of 4-beam laser interference patterns for nanolithography. Parameters of 4-beam interference patterns including the pattern amplitude, period, orientation and uniformity were discussed. Analytical expressions were obtained for the spatial distribution of radiation of the interfering beams as a function of their amplitudes, phases, angles of incidence on the sample, and polarization planes with computer simulation and experimental results.

Paper Details

Date Published: 12 June 2007
PDF: 8 pages
Proc. SPIE 6593, Photonic Materials, Devices, and Applications II, 65930I (12 June 2007); doi: 10.1117/12.723782
Show Author Affiliations
Jin Zhang, Cardiff Univ. (United Kingdom)
Zuobin Wang, Cardiff Univ. (United Kingdom)
Yury K. Verevkin, Institute of Applied Physics (Russia)
Santiago M. Olaizola, CEIT and Tecnun, Univ. of Navarra (Spain)
Changsi Peng, Tampere Univ. of Technology (Finland)
Chunlei Tan, Tampere Univ. of Technology (Finland)
Ainara Rodriguez, CEIT and Tecnun, Univ. of Navarra (Spain)
Eric Y. Daume, Institute of Applied Physics (Russia)
Thierry Berthou, SILIOS Technologies (France)
Stéphane Tisserand, SILIOS Technologies (France)
Ze Ji, Cardiff Univ. (United Kingdom)

Published in SPIE Proceedings Vol. 6593:
Photonic Materials, Devices, and Applications II
Ali Serpengüzel; Gonçal Badenes; Giancarlo C. Righini, Editor(s)

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