Share Email Print
cover

Proceedings Paper

Current developments and applications using multi-beam laser interference lithography for nanoscale structuring of materials
Author(s): S. Z. Su; Ainhara Rodríguez; Santiago M. Olaizola; C. S. Peng; C. Tan; Yury K. Verevkin; Thierry Berthoud; Stéphane Tisserand
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Multi-beam laser interference lithography (MB-LIL) is a rapid and cost-effective maskless optical lithography technique to parallelly pattern periodic or quasi- periodic micro/nano-structured material over large areas more than square centimetres. An interference pattern between two or more coherent laser beams is set up and recorded in a recording material of substrate. This interference pattern consists of a periodic series of geometries representing intensity minima and maxima. The patterns that can be formed depend on the number and configuration of laser beams. This review introduces the development and application of MB-LIL system for fabrication of micro/nano-structured material. At first, it surveys various types of MB-LIL methods by classifying different beam configurations. Then the paper shows some application results for fabrication 2D/3D micro/nano structure arrays by means of interference patterns with multi-exposed or directly ablation technique. The patterend micro/nano-structure arrays include crossed diffraction grating array in photoresist, 3D pattern in polymetric photonic crystals, and magnetic nanoarrays in thin film. Finally, an innovative four-beam LIL system is introduced, which is being developed within the EC-granted project DELILA.

Paper Details

Date Published: 25 June 2007
PDF: 8 pages
Proc. SPIE 6593, Photonic Materials, Devices, and Applications II, 65930G (25 June 2007); doi: 10.1117/12.723620
Show Author Affiliations
S. Z. Su, Cardiff Univ. (United Kingdom)
Ainhara Rodríguez, CEIT and Tecnun, Univ. of Navarra (Spain)
Santiago M. Olaizola, CEIT and Tecnun, Univ. of Navarra (Spain)
C. S. Peng, Tampere Univ. of Technology (Finland)
C. Tan, Tampere Univ. of Technology (Finland)
Yury K. Verevkin, Institute of Applied Physics (Russia)
Thierry Berthoud, SILIOS Technologies (France)
Stéphane Tisserand, SILIOS Technologies (France)


Published in SPIE Proceedings Vol. 6593:
Photonic Materials, Devices, and Applications II
Ali Serpengüzel; Gonçal Badenes; Giancarlo C. Righini, Editor(s)

© SPIE. Terms of Use
Back to Top