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Proceedings Paper

Design, conception, and metrology of EUV mirrors for aggressive environments
Author(s): Christophe Hecquet; Marie-Françoise Ravet-Krill; Franck Delmotte; Arnaud Jérôme; Aurélie Hardouin; Françoise Bridou; Françoise Varnière; Marc Roulliay; Frédéric Bourcier; Jean-Michel Desmarres; Vincent Costes; Jacques Berthon; André Rinchet; Roland Geyl
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Paper Abstract

The development of new high power EUV sources and EUV space imaging requires optics having specific properties which depend on applications and operating conditions. These both applications are very different in the working multilayers environment. For the high power sources, multilayers are submitted to short pulses with high energy peak whereas, for the space imaging, multilayers are submitted to continuous flux with low level. Moreover photon energy and environment for both applications may be different. The environment may affect structure and top layer contamination when optics are stored, handled, mounted on the final device and finally operating. Main environmental parameters investigated are temperature and humidity variation. One objective is the optimisation of multilayer coatings to offer the highest resistance under photonic, ionic fluxes and temperature cycle. This means that interfacial diffusion between thin layers and degradation of the capping layers have to be avoided or reduced. The present study relies with designing, depositing and testing different structures of multilayer coatings in order to minimise the influence of the environment. Multilayer coatings based on molybdenum, silicon and silicon carbide materials have been deposited by magnetron sputtering on silicon and zerodur substrates. Samples were submitted to radiations emitted by an EUV source at wavelength closed to 13.5 nm. Furthermore they were also submitted to thermal cycles and annealing under warm humidity in the aim to simulate extremes storage or handling conditions as space mission's conditions. The damages and the performance of the multilayers were evaluated by using grazing incidence reflectometry at 0.154 nm and EUV reflectometry at the operating wavelength. After a presentation of the multilayer design, deposition and metrology tools, we will describe the different environmental effects on the coatings to take in care during EUV source exposure, handling and storage conditions. First results on multilayers performances to EUV source exposure and space specification tests are presented. Main damages studies were on annealing, thermal cycling and warm humidity.

Paper Details

Date Published: 18 May 2007
PDF: 10 pages
Proc. SPIE 6586, Damage to VUV, EUV, and X-ray Optics, 65860X (18 May 2007); doi: 10.1117/12.723483
Show Author Affiliations
Christophe Hecquet, Lab. Charles Fabry de l'Institut d'Optique, CNRS, Univ. Paris-Sud (France)
Marie-Françoise Ravet-Krill, Lab. Charles Fabry de l'Institut d'Optique, CNRS, Univ. Paris-Sud (France)
Franck Delmotte, Lab. Charles Fabry de l'Institut d'Optique, CNRS, Univ. Paris-Sud (France)
Arnaud Jérôme, Lab. Charles Fabry de l'Institut d'Optique, CNRS, Univ. Paris-Sud (France)
Aurélie Hardouin, Lab. Charles Fabry de l'Institut d'Optique, CNRS, Univ. Paris-Sud (France)
Françoise Bridou, Lab. Charles Fabry de l'Institut d'Optique, CNRS, Univ. Paris-Sud (France)
Françoise Varnière, Lab. Charles Fabry de l'Institut d'Optique, CNRS, Univ. Paris-Sud (France)
Marc Roulliay, Lab. D'Intéraction du rayonnement X Avec la Matière, CNRS, Univ. Paris-Sud (France)
Frédéric Bourcier, Ctr. National d'Etude Spatial (France)
Jean-Michel Desmarres, Ctr. National d'Etude Spatial (France)
Vincent Costes, Ctr. National d'Etude Spatial (France)
Jacques Berthon, Ctr. National d'Etude Spatial (France)
André Rinchet, SAGEM Défense Sécurité (France)
Roland Geyl, SAGEM Défense Sécurité (France)


Published in SPIE Proceedings Vol. 6586:
Damage to VUV, EUV, and X-ray Optics
Libor Juha; Ryszard H. Sobierajski; Hubertus Wabnitz, Editor(s)

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