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Proceedings Paper

Chemical mechanical planarization for high precision optics
Author(s): Francois Batllo; Kevin Moeggenborg; Stan Lesiak; Roman Salij
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Paper Abstract

For many years, Chemical Mechanical Planarization (CMP) has enabled the fabrication of highperformance multilevel integrated circuits for the electronics industry. While CMP techniques are now being used in the manufacturing of optical devices, the concepts and mechanisms of CMP are not yet fully understood by the optics industry. In this paper, an overview of CMP fundamentals and the potential benefits and challenges of using a CMP approach in producing optics will be presented. Examples across several applications will be discussed.

Paper Details

Date Published: 14 May 2007
PDF: 4 pages
Proc. SPIE TD04, Optifab 2007: Technical Digest, TD0408 (14 May 2007); doi: 10.1117/12.722153
Show Author Affiliations
Francois Batllo, Cabot Microelectronics (United States)
Kevin Moeggenborg, Cabot Microelectronics (United States)
Stan Lesiak, Cabot Microelectronics (United States)
Roman Salij, Cabot Microelectronics (United States)


Published in SPIE Proceedings Vol. TD04:
Optifab 2007: Technical Digest
James J. Kumler; Matthias Pfaff, Editor(s)

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