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Proceedings Paper

Post-etching shaping of macroporous silicon
Author(s): T. Trifonov; M. Garín; A. Rodríguez; P. Ortega; L. F. Marsal; R. Alcubilla
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Paper Abstract

There is a limited variety of pore shapes that can be attained by electrochemical etching itself. We show that these limitations can be overcome and new pore geometries can be realized by additional post-etching treatment of macroporous silicon. Repeated oxidation and subsequent oxide-removal steps are used to correct the initially faceted pore cross-section and to obtain cylindrical pores. We demonstrate that the anisotropy of oxidation process is just opposite to the anisotropy exhibited by the electrochemical etching and accounts for the observed evolution of pore shape from a rounded square towards circular one. On the other hand, alkaline post-etching treatment is used to fabricate pores with square cross-section. Careful choice of concentration, alcohol additives and temperature of alkaline solution allows for certain crystallographic directions to be preferentially etched. In this way, pores with square, eight-sided (octagonal) or rotated square shapes can be attained. When applied on 2D macropore arrays with modulated pores, such post-etching treatment enables the realization of truly 3D structures with very complex geometries.

Paper Details

Date Published: 12 June 2007
PDF: 12 pages
Proc. SPIE 6593, Photonic Materials, Devices, and Applications II, 65931Q (12 June 2007); doi: 10.1117/12.722079
Show Author Affiliations
T. Trifonov, Univ. Politècnica de Catalunya (Spain)
M. Garín, Univ. Politècnica de Catalunya (Spain)
A. Rodríguez, Univ. Politècnica de Catalunya (Spain)
P. Ortega, Univ. Politècnica de Catalunya (Spain)
L. F. Marsal, Univ. Rovira i Virgili (Spain)
R. Alcubilla, Univ. Politècnica de Catalunya (Spain)

Published in SPIE Proceedings Vol. 6593:
Photonic Materials, Devices, and Applications II
Ali Serpengüzel; Gonçal Badenes; Giancarlo C. Righini, Editor(s)

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