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Proceedings Paper

Emerging patterning materials: trends, challenges, and opportunities in patterning and materials by design
Author(s): Daniel J. C. Herr
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Paper Abstract

Patterning technology is entering the nanomaterials era. Breakthrough advances in the basic sciences over the last twenty years are catalyzing novel material and assembly options. In the near future, these options may warrant consideration for fabricating advanced information processing technologies. However, material technology advances alone are not sufficient to induce changes and chemical substitution in manufacturing. In fact, manufacturing technology will change only when no other option exists. Therefore, the concurrent trend in lithographic challenges is noteworthy. Recent revisions of the International Technology Roadmap for Semiconductors (ITRS) indicate that it is becoming increasingly difficult for mainstream lithographic technologies to satisfy projected ITRS dimensional scaling requirements, shown in Table 1.

Paper Details

Date Published: 6 April 2007
PDF: 13 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651903 (6 April 2007); doi: 10.1117/12.721750
Show Author Affiliations
Daniel J. C. Herr, Semiconductor Research Corp. (United States)

Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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