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Proceedings Paper

Optical lithography: 40 years and holding
Author(s): John H. Bruning
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Paper Abstract

Optical lithography has been the dominant patterning process for semiconductor fabrication for over 40 years. The patterning process evolved initially from methods used in the printing industry, but as integrated circuits became more complex, and as device geometries shrank, sophisticated new imaging methods evolved. Today’s optical lithography systems represent the highest resolution, most accurate optical imaging systems ever produced. This remarkable evolutionary process continues to this day, paced by "Moore's Law". The evolutionary development of lithography systems over the last 40 years is reviewed along with a brief discussion of options for the future.

Paper Details

Date Published: 27 March 2007
PDF: 13 pages
Proc. SPIE 6520, Optical Microlithography XX, 652004 (27 March 2007); doi: 10.1117/12.720631
Show Author Affiliations
John H. Bruning, Corning Tropel Corp. (United States)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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