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Proceedings Paper

Future directions for CMOS device technology development from a system application perspective
Author(s): Tak H. Ning
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Paper Abstract

The development of CMOS technology has been, and will remain, driven by system needs. Traditionally, these needs have been met quite satisfactorily by simply reducing the physical size of the transistors as guided by the MOSFET scaling theory and increasing the chip-level integration density as anticipated from "Moore’s Law." Now that CMOS has reached its scaling limits, continued progress has to come from innovations beyond the traditional development paths, guided by anticipating and addressing system designers' concerns and needs. In this talk, we examine several opportunities for extending current CMOS technology to continue satisfying the needs of system designers.

Paper Details

Date Published: 27 March 2007
PDF: 5 pages
Proc. SPIE 6520, Optical Microlithography XX, 652003 (27 March 2007); doi: 10.1117/12.720629
Show Author Affiliations
Tak H. Ning, IBM Thomas J. Watson Research Ctr. (United States)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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