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Proceedings Paper

Simulating droplet dynamics during evaporation-driven self-assembly
Author(s): John J. Dyreby; Kevin T. Turner; Gregory F. Nellis
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Paper Abstract

A modeling methodology based on the coupling of free surface energy minimization techniques and computational fluid dynamics (CFD) modeling has been developed for simulating the macro-regime of evaporation-driven self-assembly processes; specifically, those processes that use lithographically defined features to precisely direct the self-assembly of particles on a substrate. Because surface tension dominates the gravitational, inertial, and viscous forces acting on the droplet, the shape of the droplet is determined as a function of its volume and pinning geometry by minimizing its surface energy. The evolution of droplet shape during evaporation is used to define the deforming control volume, over which the governing partial differential equations for conservation of mass, momentum, and particle concentration are solved. By decoupling the free surface and the flow models, a diverse range of problems can be investigated. The macro-scale model is envisioned as one part of a hierarchical model that can be used to study the entire lithographically-directed, evaporation-driven self-assembly process.

Paper Details

Date Published: 21 March 2007
PDF: 9 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651738 (21 March 2007); doi: 10.1117/12.720620
Show Author Affiliations
John J. Dyreby, Univ. of Wisconsin-Madison (United States)
Kevin T. Turner, Univ. of Wisconsin-Madison (United States)
Gregory F. Nellis, Univ. of Wisconsin-Madison (United States)

Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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