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Proceedings Paper

Silicon-silicon nitride coatings for reduced angle and polarization sensitivity
Author(s): Justin Mosier; Bruce Lairson
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Paper Abstract

Durable silicon–silicon nitride films have been created that exhibit low angle shift and reduced s and p polarization separation. The more common silicon dioxide – metal oxide films often have performance problems at large angles. They are inherently sensitive to angle of incidence and thus are prone to alignment issues and cone angle effects of the incident light. In contrast, silicon–silicon nitride films have much higher average optical indices and thus are ideal for applications were spectral form and placement are critical at large angles of incidence and when cone angle considerations are important. In addition, the difference in the spectral performance between the s and p polarizations is greatly reduced with silicon–silicon nitride films, offering more alignment flexibility when polarized sources are required. The silicon–silicon nitride films were found to be environmentally durable, and can be applied to a variety of substrates and substrate geometries, including plano, spherical domes, and complex parabolic surfaces.

Paper Details

Date Published: 14 May 2007
PDF: 3 pages
Proc. SPIE 10316, Optifab 2007: Technical Digest, 103161L (14 May 2007); doi: 10.1117/12.719783
Show Author Affiliations
Justin Mosier, Deposition Sciences, Inc. (United States)
Bruce Lairson, Deposition Sciences, Inc. (United States)

Published in SPIE Proceedings Vol. 10316:
Optifab 2007: Technical Digest
James J. Kumler; Matthias Pfaff, Editor(s)

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