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Proceedings Paper

ArF pellicle degradation mechanism for resolving CD variation
Author(s): Hyungseok Choi; Yohan Ahn; Jua Ryu; Yangkoo Lee; Bumhyun An; Seokryeol Lee
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Paper Abstract

With the introduction of ArF laser, a binary mask is preferred because a PSM mask is still weak to the crystal defect called as photomask haze although extensive studies trying to resolve the haze impact to a photomask have been performed by various researchers in company and school. However, a new problem was happened after a binary mask introduction that CD variation in an exposure shot is appeared and is gradually increased. And finally, CD variation considerably causes defects in wafer level. It was proven that CD variation is closely related to the change of the reticle transmittance by a lot of researches. In this study, the mechanism of ArF pellicle degradation is focused on because the pellicle degradation affects a reticle transmittance in direct. The components outgassed from a pellicle by the high photon energy of ArF laser, for example carbon or fluorine, are absorbed on the surface of the reticle, so that the transmittance of the reticle is decreased. The phenomena of the pellicle degradation have been studied by the various viewpoints, theoretical background, experiment and results tested in mass production line in this study. Therefore, this study has the important meaning by providing the substantial clues to resolve CD variation problem in a near future.

Paper Details

Date Published: 5 April 2007
PDF: 6 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65184Z (5 April 2007); doi: 10.1117/12.718338
Show Author Affiliations
Hyungseok Choi, Samsung Electronics Co., Ltd. (South Korea)
Yohan Ahn, Samsung Electronics Co., Ltd. (South Korea)
Jua Ryu, Samsung Electronics Co., Ltd. (South Korea)
Yangkoo Lee, Samsung Electronics Co., Ltd. (South Korea)
Bumhyun An, Samsung Electronics Co., Ltd. (South Korea)
Seokryeol Lee, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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