Share Email Print

Proceedings Paper

Automatic viscosity controlled production of photoresist
Author(s): Woo Sok Chang; Christos Monovoukas; Michael Tanaka; Norbert Fronczak
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Viscosity of photoresist is an important product parameter because it determines film thickness during spin coating. Producers of photoresist, therefore, have established manufacturing procedures which require that fluid viscosity be measured several times during production to ensure product quality. Periodic samples are taken off-line to an analytical laboratory where viscosity is measured under controlled conditions. However, off-line measurements, interrupt production, engage valuable human resources, and fail to provide adequate process feedback. This paper describes the implementation of an automatic viscosity-controlled production process of photoresist using a unique in-line viscometer. The automated photoresist production process increases throughput and improves product quality. With sufficient accuracy and repeatability of the measurements, it is now possible to correlate and predict film thickness with viscosity values taken during photoresist production.

Paper Details

Date Published: 21 March 2007
PDF: 8 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65193N (21 March 2007); doi: 10.1117/12.717976
Show Author Affiliations
Woo Sok Chang, Levitronix (United States)
Christos Monovoukas, Levitronix (United States)
Michael Tanaka, JSR Micro, Inc. (United States)
Norbert Fronczak, JSR Micro, Inc. (United States)

Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

© SPIE. Terms of Use
Back to Top