Share Email Print
cover

Proceedings Paper

Quantum state control interference lithography and trim double patterning for 32-16-nm lithography
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Double patterning has been proposed as a method to extend DUV lithography to 32nm and below. Here, a new form of double, or higher, multiple exposure technique is proposed. This new form of lithography uses a combination of Quantum State Control (QuSC) chemistry, Amplitude Modulation Optical Lithography (AMOL), and multiple micro-stepped exposures, without development between exposures. Further it is proposed to use this form of lithography (called QuSC-litho), to pattern a perfect grating grid, and to trim this grid with an earlier generation lithography tool. QuSC lithography uses short optical pulses to modulate a photochemical pathway while an intermediate is still in a defined vibrational excited state. This is a variation of Stimulated Emission Depletion Microscopy (STED) developed for fluorescence microscopy. With this approach immersion tools that produce 90 nm pitch and 45 nm features should be able to pattern levels with 22 nm features with a 1:1 line-space ratio. This approach is much less sensitive to misalignment than present double patterning approaches. Key to successful deployment of QuSC lithography is defining a resist photochemistry consistent with the QuSC process. There are several approaches to Photo Acid Generator (PAG) - matrix interaction that may be consistent with this approach.

Paper Details

Date Published: 26 March 2007
PDF: 8 pages
Proc. SPIE 6520, Optical Microlithography XX, 65202L (26 March 2007); doi: 10.1117/12.717731
Show Author Affiliations
Robert D. Frankel, Rochester Institute of Technology (United States)
Bruce W. Smith, Rochester Institute of Technology (United States)
Andrew Estroff, Rochester Institute of Technology (United States)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

© SPIE. Terms of Use
Back to Top