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Proceedings Paper

Study of the thermal characteristic of x-ray mask during short-pulsed exposure
Author(s): Hongyan Shang; Yongkun Wang
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Paper Abstract

Three-dimensional finite element short-pulsed models of X-ray mask have been developed and the energy absorption function along the mask thickness direction has been considered. The results show that the absorber's temperature is higher than the substrate's because the absorber has higher absorption coefficient. In addition, the lower the absorber coverage of the mask, the lower the mask temperature is. The transient simulation results show that the mask temperature reached the maximum at the end of the short-pulsed exposure. It occurs at the interface between the substrate and the absorber, and the maximum is 52.7°C.

Paper Details

Date Published: 6 November 2006
PDF: 5 pages
Proc. SPIE 6357, Sixth International Symposium on Instrumentation and Control Technology: Signal Analysis, Measurement Theory, Photo-Electronic Technology, and Artificial Intelligence, 63573M (6 November 2006); doi: 10.1117/12.717246
Show Author Affiliations
Hongyan Shang, Shanghai Maritime Univ. (China)
Yongkun Wang, Beijing Univ. of Aeronautics and Astronautics (China)


Published in SPIE Proceedings Vol. 6357:
Sixth International Symposium on Instrumentation and Control Technology: Signal Analysis, Measurement Theory, Photo-Electronic Technology, and Artificial Intelligence
Jiancheng Fang; Zhongyu Wang, Editor(s)

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