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Proceedings Paper

Model-assisted routing for improved lithography robustness
Author(s): Tim Kong; Hardy Leung; Vivek Raghavan; Alfred K. Wong; Sarah Xu
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Paper Abstract

This paper presents a model-assisted routing technique for improving lithography robustness of synthesized layouts. Presupposing an accurate lithography model and a model-based layout weak spot identification procedure, this method produces routed layout in-situ with acceptable turn around time. The approach starts with a conventionally routed layout that, although conforming to design rules, may contain undesirable layout configurations that the router should reconcile. Since weak spot identification is computation intensive, rule-based filtering is first applied to the incoming layout to select regions for further model-based analysis. The router then performs a non-discriminate correction to reduce the number of potential weak spots. This reduced set subsequently undergoes model-based weak spot analysis, distinguishing the actual weak spots. The router finally optimizes the layout to remove the identified weak spots. This technique has been implemented in an industry detail router, and tested with 65-nm technology. Experimental results show that this method can effectively remove actual weak spots with reasonable runtime.

Paper Details

Date Published: 21 March 2007
PDF: 5 pages
Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 65210D (21 March 2007); doi: 10.1117/12.717055
Show Author Affiliations
Tim Kong, Magma Design Automation, Inc. (United States)
Hardy Leung, Magma Design Automation, Inc. (United States)
Vivek Raghavan, Magma Design Automation, Inc. (United States)
Alfred K. Wong, Magma Design Automation, Inc. (United States)
Sarah Xu, Magma Design Automation, Inc. (United States)


Published in SPIE Proceedings Vol. 6521:
Design for Manufacturability through Design-Process Integration
Alfred K.K. Wong; Vivek K. Singh, Editor(s)

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