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Proceedings Paper

Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry
Author(s): Oleg Kritsun; Bruno La Fontaine; Richard Sandberg; Alden Acheta; Harry J. Levinson; Kevin Lensing; Mircea Dusa; Jan Hauschild; Anita Pici; Chandra Saravanan; Kunie Primak; Rahul Korlahalli; Srinivasan Nirmalgandhi
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Paper Abstract

Scatterometry techniques are used to characterize the CD uniformity, focus and dose control, as well as the image contrast of a hyper-NA immersion lithography scanner. Results indicate very good scanner control and stability of these parameters, as well as good precision and sensitivity of the metrology techniques.

Paper Details

Date Published: 26 March 2007
PDF: 10 pages
Proc. SPIE 6520, Optical Microlithography XX, 65200L (26 March 2007); doi: 10.1117/12.715971
Show Author Affiliations
Oleg Kritsun, Advanced Micro Devices, Inc. (United States)
Bruno La Fontaine, Advanced Micro Devices, Inc. (United States)
Richard Sandberg, Advanced Micro Devices, Inc. (United States)
Alden Acheta, Advanced Micro Devices, Inc. (United States)
Harry J. Levinson, Advanced Micro Devices, Inc. (United States)
Kevin Lensing, Advanced Micro Devices, Inc. (United States)
Mircea Dusa, ASML MaskTools Inc. (United States)
Jan Hauschild, ASML MaskTools Inc. (United States)
Anita Pici, ASML MaskTools Inc. (United States)
Chandra Saravanan, Nanometrics Inc. (United States)
Kunie Primak, Nanometrics Inc. (United States)
Rahul Korlahalli, Nanometrics Inc. (United States)
Srinivasan Nirmalgandhi, Nanometrics Inc. (United States)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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