Share Email Print
cover

Proceedings Paper

Exposure of molecular glass resist by e-beam and EUVIL
Author(s): Cyril Vannuffel; Damien Djian; Serge Tedesco; Dimitra Niakoula; Panagiotis Argitis; Veroniki P. Vidali; Elias Couladouros; Harun Solak
Format Member Price Non-Member Price
PDF $17.00 $21.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Molecular resist have potential interest for low CDs and LERs required in future lithography technology. The lithographic ability of one of them is exposed in this study, by e-beam and by EUV-IL. Work on process condition is described and leads to dense-lines resolution down to 32.5nm for.

Paper Details

Date Published: 26 March 2007
PDF: 10 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651949 (26 March 2007); doi: 10.1117/12.714263
Show Author Affiliations
Cyril Vannuffel, CEA-Leti (France)
Damien Djian, CEA-Leti (France)
Serge Tedesco, CEA-Leti (France)
Dimitra Niakoula, Institute of Microelectronics (Greece)
Panagiotis Argitis, Institute of Microelectronics (Greece)
Veroniki P. Vidali, Institute of Physical-Chemistry (Greece)
Elias Couladouros, Institute of Physical-Chemistry (Greece)
Harun Solak, Paul Scherrer Institut (Switzerland)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

© SPIE. Terms of Use
Back to Top