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Proceedings Paper

Exposure of molecular glass resist by e-beam and EUVIL
Author(s): Cyril Vannuffel; Damien Djian; Serge Tedesco; Dimitra Niakoula; Panagiotis Argitis; Veroniki P. Vidali; Elias Couladouros; Harun Solak
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Paper Abstract

Molecular resist have potential interest for low CDs and LERs required in future lithography technology. The lithographic ability of one of them is exposed in this study, by e-beam and by EUV-IL. Work on process condition is described and leads to dense-lines resolution down to 32.5nm for.

Paper Details

Date Published: 26 March 2007
PDF: 10 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651949 (26 March 2007); doi: 10.1117/12.714263
Show Author Affiliations
Cyril Vannuffel, CEA-Leti (France)
Damien Djian, CEA-Leti (France)
Serge Tedesco, CEA-Leti (France)
Dimitra Niakoula, Institute of Microelectronics (Greece)
Panagiotis Argitis, Institute of Microelectronics (Greece)
Veroniki P. Vidali, Institute of Physical-Chemistry (Greece)
Elias Couladouros, Institute of Physical-Chemistry (Greece)
Harun Solak, Paul Scherrer Institut (Switzerland)

Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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