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Proceedings Paper

Optical characterization of microstructures of high aspect ratio
Author(s): T. Tamulevicius; S. Tamulevicius; M. Andrulevicius; G. Janusas; V. Ostasevicius; A. Palevicius
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Paper Abstract

In the present research we have fabricated and investigated microfluidic device (system of periodic groves - diffraction grating) employing contact photolithography combined with the reactive ion etching (RIE). Relative diffraction efficiency of diffraction gratings (originally produced in silicon substrates) was measured experimentally and simulated using linear dimensions of gratings defined by scanning electron microscopy (SEM). The main experimental results were compared with the computer simulations where the standard software ("PCGrate-S 6.1") was employed to calculate relative diffraction efficiency of diffraction gratings for the different wavelengths of visible light. Comparing two evaluation methods: direct (electron microscopy) and indirect (relative diffraction efficiency measured at different angles of incidence for the three wavelengths of light) we have demonstrated feasibility of optical methods in control of geometrical dimensions of periodic structures at the microscopic range.

Paper Details

Date Published: 5 April 2007
PDF: 9 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65183Q (5 April 2007); doi: 10.1117/12.714245
Show Author Affiliations
T. Tamulevicius, Kaunas Univ. of Technology (Lithuania)
S. Tamulevicius, Kaunas Univ. of Technology (Lithuania)
M. Andrulevicius, Kaunas Univ. of Technology (Lithuania)
G. Janusas, Kaunas Univ. of Technology (Lithuania)
V. Ostasevicius, Kaunas Univ. of Technology (Lithuania)
A. Palevicius, Kaunas Univ. of Technology (Lithuania)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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