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Proceedings Paper

Thermal imaging of a lithography cell, including exposure tool, using a self-contained instrumented wafer
Author(s): Zach Reid; Mark Wiltse; Sandy Burgan; Gregory Roche
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Paper Abstract

A spatial and temporal thermal image of a lithography cell from resist dispense through develop is obtained with a novel instrumented wafer. The wireless sensing wafer was able detect temperature changes the occurred during the photoresist dispense and exposure steps as well as in the photoresist bake steps.

Paper Details

Date Published: 5 April 2007
PDF: 10 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65183S (5 April 2007); doi: 10.1117/12.714231
Show Author Affiliations
Zach Reid, SensArray Corp. (United States)
Mark Wiltse, SensArray Corp. (United States)
Sandy Burgan, SensArray Corp. (United States)
Gregory Roche, SensArray Corp. (United States)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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