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Proceedings Paper

Automatic OPC mask shape repair
Author(s): James Word; Dragos Dudau; Nick Cobb
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Paper Abstract

Virtual manufacturing, enabled by rapid, full-chip simulation is a critical component of the mask tapeout flow in the low-k1 lithography era. Virtual manufacturing enables first-time-right silicon manufacturing by detecting printing failures before a costly and time-consuming mask tapeout and wafer print has occurred. This is especially true in the latest tapeout flows which include Optical Proximity Correction (OPC) and various Resolution Enhancement Technologies (RET). One issue arising with the addition of virtual manufacturing to the mask tapeout flow is the proper user response to any detected failures. The authors will present one vision for OPC mask shape defect handling which can be completely integrated within the user's existing flow, and most importantly, requires no human intervention to disposition, waive, and/or repair detected mask shape defects.

Paper Details

Date Published: 21 March 2007
PDF: 8 pages
Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 65211G (21 March 2007); doi: 10.1117/12.714014
Show Author Affiliations
James Word, Mentor Graphics Corp. (United States)
Dragos Dudau, Mentor Graphics Corp. (United States)
Nick Cobb, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 6521:
Design for Manufacturability through Design-Process Integration
Alfred K.K. Wong; Vivek K. Singh, Editor(s)

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