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Proceedings Paper

Defects, overlay, and focus performance improvements with five generations of immersion exposure systems
Author(s): Jan Mulkens; Bob Streefkerk; Hans Jasper; Jos de Klerk; Fred de Jong; Leon Levasier; Martijn Leenders
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Paper Abstract

This paper discusses the current performance and the evolution of five generations TWINSCAN immersion scanning exposure tools. It is shown that production worthy overlay and focus performance can be achieved at high scan speeds. The more critical part for immersion tools is related to defects, but also here improvements resulted in production worthy defect levels. In order to keep the defect level stable special measures are needed in the application of wafers. Especially Edge Bead Removal (EBR) design and wafer bevel cleanliness are important.

Paper Details

Date Published: 19 March 2007
PDF: 11 pages
Proc. SPIE 6520, Optical Microlithography XX, 652005 (19 March 2007); doi: 10.1117/12.713577
Show Author Affiliations
Jan Mulkens, ASML Netherlands B.V. (Netherlands)
Bob Streefkerk, ASML Netherlands B.V. (Netherlands)
Hans Jasper, ASML Netherlands B.V. (Netherlands)
Jos de Klerk, ASML Netherlands B.V. (Netherlands)
Fred de Jong, ASML Netherlands B.V. (Netherlands)
Leon Levasier, ASML Netherlands B.V. (Netherlands)
Martijn Leenders, ASML Netherlands B.V. (Netherlands)

Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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