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Proceedings Paper

New resists and processes for UV-imprint lithography
Author(s): Kenneth R. Carter; Sarav B. Jhaveri; Erik C. Hagberg; Mark W. Hart
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Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65191B; doi: 10.1117/12.713458
Show Author Affiliations
Kenneth R. Carter, Univ. of Massachusetts/Amherst (United States)
Sarav B. Jhaveri, Univ. of Massachusetts/Amherst (United States)
Erik C. Hagberg, IBM Almaden Research Ctr. (United States)
Mark W. Hart, IBM Almaden Research Ctr. (United States)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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