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Proceedings Paper

Metrology challenges for advanced lithography techniques
Author(s): Ilan Englard; Peter Vanoppen; Jo Finders; Ingrid Minnaert-Janssen; Frank Duray; Jeroen Meessen; Gert-Jan Janssen; Ofer Adan; Liraz Gershtein; Ram Peltinov; Claudio Masia; Richard Piech
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Paper Abstract

Traditionally CD SEM has been positioned as a local critical dimension measurement and analysis technique. Emerging lithography techniques introduce new challenges for CD SEM such as overlay error measurements. For the sub 45 nm technology nodes, several new lithography approaches are developed that rely on multiple lithography and deposition and etch process steps. Seamless integration of these lithography and deposition and etch process steps requires specific CD and/or overlay metrology capability for optimal CD and overlay registration performance. Areas of development are focused on CD measurement algorithms and correlation after resist develop and subsequent etch steps. These new lithography processes require unprecedented accuracy and overlay resolution. Fundamental and application specific metrology challenges and solutions will be highlighted. In addition, this paper will report on unique overlay target design in combination with innovative CD SEM measurement techniques to meet those challenges.

Paper Details

Date Published: 5 April 2007
PDF: 9 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65181G (5 April 2007); doi: 10.1117/12.713455
Show Author Affiliations
Ilan Englard, Applied Materials Europe (Netherlands)
Peter Vanoppen, ASML Netherlands (Netherlands)
Jo Finders, ASML Netherlands (Netherlands)
Ingrid Minnaert-Janssen, ASML Netherlands (Netherlands)
Frank Duray, ASML Netherlands (Netherlands)
Jeroen Meessen, ASML Netherlands (Netherlands)
Gert-Jan Janssen, ASML Netherlands (Netherlands)
Ofer Adan, Applied Materials Europe (Israel)
Liraz Gershtein, Applied Materials Europe (Israel)
Ram Peltinov, Applied Materials Europe (Israel)
Claudio Masia, Applied Materials Europe (Israel)
Richard Piech, Applied Materials Europe (Netherlands)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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