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Proceedings Paper

Process window study with various illuminations for EUV lithography applications
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Paper Abstract

EUV lithography has the ability to support 22 nm logic manufacturing and beyond. Similar to the DUV lithographic systems, partial coherence on EUV lithographic systems can have a big impact on process latitude for critical layers. Thus, it is important to understand the effect of partial coherence on EUV imaging systems. In this paper, process windows with various illumination settings are investigated. The experiments are conducted using the MET station at the Advance Light Source (ALS). In addition to the annular and dipole illuminations which reported in our last paper1, C-quad and Quad illuminations are used to explore the impact of the partial coherence on the process window. Even though the MET system has resolutions below 30nm dense lines, the exposures are targeted for 60nm, 50nm, and 45nm dense features due to the resist limitation. The experimental results are compared with simulation results using Intel's lithography modeling tool, I-Photo. Resist and aerial image threshold models are used for the comparison study. The experimental results correlate well with the resist based simulation results, but some discrepancies are observed for the aerial image threshold cases. We believe the discrepancies are due to the resist limitations. We found that the dipole shows the largest Depth of Focus for dense lines and spaces.

Paper Details

Date Published: 21 March 2007
PDF: 8 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65172P (21 March 2007); doi: 10.1117/12.713447
Show Author Affiliations
Sang Hun Lee, Intel Corp. (United States)
Zhiyu Zhang, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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