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Proceedings Paper

Novel diamantane polymer platform for enhanced etch resistance
Author(s): Munirathna Padmanaban; Srinivasan Chakrapani; Guanyang Lin; Takanori Kudo; Deepa Parthasarathy; Dalil Rahman; Clement Anyadiegwu; Charito Antonio; Ralph R. Dammel; Shenggao Liu; Frederick Lam; Anthony Waitz; Masao Yamagchi; Takayuki Maehara
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Paper Abstract

The dominant current 193 nm photoresist platform is based on adamantane derivatives. This paper reports on the use of derivatives of diamantane, the next higher homolog of adamantane, in the diamondoid series, as monomers in photoresists. Due to their low Ohnishi number and incremental structural parameter (ISP), such molecules are expected to enhance dry etch stability when incorporated into polymers for resist applications. Starting from the diamantane parent, cleavable and non-cleavable acrylate/methacrylate derivatives of diamantane were obtained using similar chemical steps as for adamantane derivatization. This paper reports on the lithographic and etch performance obtained with a number of diamantane-containing monomers, such as 9-hydroxy-4-diamantyl methacrylate (HDiMA), 2-ethyl-2- diamantyl methacrylate (EDiMA), and 2-methyl-2-diamantyl methacrylate (MDiMA). The etch advantage, dry and wet lithographic performance of some of the polymers obtained from these diamantane-containing polymers are discussed.

Paper Details

Date Published: 9 April 2007
PDF: 10 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65190G (9 April 2007); doi: 10.1117/12.713111
Show Author Affiliations
Munirathna Padmanaban, AZ Electronic Materials USA Corp. (United States)
Srinivasan Chakrapani, AZ Electronic Materials USA Corp. (United States)
Guanyang Lin, AZ Electronic Materials USA Corp. (United States)
Takanori Kudo, AZ Electronic Materials USA Corp. (United States)
Deepa Parthasarathy, AZ Electronic Materials USA Corp. (United States)
Dalil Rahman, AZ Electronic Materials USA Corp. (United States)
Clement Anyadiegwu, AZ Electronic Materials USA Corp. (United States)
Charito Antonio, AZ Electronic Materials USA Corp. (United States)
Ralph R. Dammel, AZ Electronic Materials USA Corp. (United States)
Shenggao Liu, MolecularDiamond Technologies, Chevron Technology Ventures (United States)
Frederick Lam, MolecularDiamond Technologies, Chevron Technology Ventures (United States)
Anthony Waitz, MolecularDiamond Technologies, Chevron Technology Ventures (United States)
Masao Yamagchi, Tokuyama Corp. (Japan)
Takayuki Maehara, Tokuyama Corp. (Japan)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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